Picture of Ion Miller Bilbo
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AVAILABLE
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1st Responsible:
2nd Responsible:
Group:
Thin Film Physics (TUNNF)
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Ion beam workstation for preparing highest quality TEM/FIB samples

  • Fast, reliable method for cleaning and post-processing of TEM and FIB samples
  • User-independent, automated operation with pre-programmed recipes
Tool name:
Ion Miller Bilbo
Category:
Sample preparation microscopy
Manufacturer:
Technoorg Linda
Model:
X

SPECIFICATIONS

LOW-ENERGY ION SOURCE

  • Ion energy: 100 - 2000 eV, continuously adjustable
  • Ion current density: max. 10 mA/cm2
  • Beam current: 7 - 80 mA, continuously adjustable
  • Beam diameter: 750 - 1200 µm (FWHM)
  • Electronically optimized working gas flow
  • 28 µm/h milling rate on c-Si at 2000 eV ion energy and at 30° angle of beam incidence

SPECIMEN STAGE

  • Milling angle: 0° - 40°, electronically adjustable in 0.1° increments
  • Computer controlled in-plane specimen rotation and oscillation (from +10° to +60°, electronically adjustable in 10° steps)
  • Remarkable thickness range of the accepted TEM samples (30 - 200 µm)

SPECIMEN HANDLING

  • Vacuum load-lock system for fast specimen exchange
  • Fully mechanical, glueless specimen loading system
  • Specially designed titanium frames and encapsulation technology for XTEM samples

VACUUM SYSTEM

  • Pfeiffer vacuum system with oil-free diaphragm and turbomolecular pumps equipped with compact, full-range Pirani/Penning vacuum gauge

GAS SUPPLY SYSTEM

  • 99.999% purity argon gas of 1.3 - 1.7 bar absolute pressure
  • Dedicated pressure regulator for noble gas service with electronic outlet pressure monitoring
  • High-precision working gas flow control via motorized needle valve

IMAGING SYSTEM

  • CMOS camera image for full visual control and milling supervision/termination
  • High-resolution color CMOS camera
  • Manual zoom video lens of 50 - 400× magnification range

COMPUTER CONTROL

  • Built-in industrial grade PC
  • Easy-to-use graphical interface and image analysis module
  • Easy control of all important parameters by mouse clicking or dragging
  • Highly automated operating regime for minimum user intervention
  • Pre-programmed or manually set milling and polishing cycles
  • Automatic termination: optical termination of the milling process supported by an image analysis module (detecting the sample perforation or monitoring the surface topography)

POWER REQUIREMENTS

  • 100 - 120 V/3.0 A/60 Hz or 220 - 240 V/1.5 A/50 Hz – single phase

MODELS

  • Gentle Mill – fully automated model
  • Gentle Mill Hi – models compatible with Hitachi FIB/STEM systems

Instructors

Licensed Users

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